Presenter(s)

David J Lombardo

Comments

This poster reflects research conducted as part of a course project designed to give students experience in the research process.

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Description

The details of how photo resist is exposed during lithography processes are extremely important to optimizing fabrication. Features such as sloped sidewalls, undercut, scalloping can be caused by the diffraction, absorption and reflection of light as it passed through the layers of mask, resist and substrate. A current method of simulating this process is with a full Finite Difference Time Domain process, which is computationally intensive and time consuming. In this project I propose and demonstrate a forward/backward spatial propagation simulation without time steps, which will capture the full electromagnetic solution including diffraction and reflections. By combining this with physical Dill Parameters of the resist a complete picture of the exposing process can be efficiently created.

Publication Date

4-5-2017

Project Designation

Course Project - Graduate

Primary Advisor

Andrew M. Sarangan, Ivan Sudakov

Primary Advisor's Department

Physics

Keywords

Stander Symposium project

Computational Lithography for Electromagnetic Wave Propogation in Photoresist

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