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Sub-wavelength wire grids have a potential to be used in in micro-polarizers since they could provide information about the state of polarization of an image in a compact format. At the same time, the fabrication process for wiregrids is compatible with semiconductor technology. In this project, theoretical analysis, computation simulations will be conducted to investigate the influence of the design parameters on the performance of polarizers manufactured using a deep UV interference lithography. Simulations were also performed to determine if acceptable performance could be achieved using a CMOS back-end-of-line metallization process. In this process, multiple layers of the metallization could be used separated by dielectric films. In the experimental process, we will demonstrate the pixelated polarizers with 0, 45, 90, 135 degree polarization orientations as a ‘super pixel’ which repeat over entire array and integrate it with a photo-detector array. The transmission, extinction ratio, spectral and angular bandwidth will be measured to evaluate the polarization imaging system and compare to the single layer polarization imaging system.

Publication Date


Project Designation

Graduate Research

Primary Advisor

Andrew M Sarangan

Primary Advisor's Department

Electro Optics Grad Program


Stander Symposium poster

Design, Fabrication and Testing Multi-Layered Metal Wire Grids Polarizer and Its Application in Polarization Imaging System