Applications of Electron-Beam Generated Plasmas to Materials Processing

Author(s)

Darrin Leonhardt, Naval Research Laboratory
Christopher Muratore, University of DaytonFollow
Scott G. Walton, Naval Research Laboratory

Document Type

Article

Publication Date

4-2005

Publication Source

IEEE Transactions on Plasma Science

Abstract

Nonequilibrium (Te≫Tion,gas) plasma processing often allows for greater process control with reduced environmental impact when compared to other materials processing methods, and therefore presents tremendous opportunities in the areas of thin film development and surface modification. The U.S. Naval Research Laboratory's "Large Area Plasma Processing System" (LAPPS) has been developed based on the high-energy (2 keV) electron-beam ionization process, with the goal of maximizing the benefits of plasma processing over large areas (∼1 m2). This system has been shown to be: 1) efficient at producing plasma in any gas composition; 2) capable of producing low-temperature plasma electrons (orientation in TiN films, due to the increased atomic nitrogen ion flux. Polymer pretreatment studies were also initiated in these systems; polytetrafluoroethylene substrates pretreated with an oxygen LAPPS exposure demonstrated a significant increase in copper and aluminum film adhesion compared to untreated substrates, with the dominant factor believed to be the changed surface morphology. Similarly dramatic fluorination of polyethylene was demonstrated with plasmas generated in Ar/SF6 mixtures.

Inclusive pages

783-790

ISBN/ISSN

0093-3813

Comments

Permission documentation is on file.

Copyright

Copyright © 2005, IEEE

Publisher

IEEE Nuclear and Plasma Sciences Society

Volume

33

Peer Reviewed

yes

Issue

2

eCommons Citation

Leonhardt, Darrin; Muratore, Christopher; and Walton, Scott G., "Applications of Electron-Beam Generated Plasmas to Materials Processing" (2005). Chemical and Materials Engineering Faculty Publications. 164.
https://ecommons.udayton.edu/cme_fac_pub/164