Title

Electron-Beam-Generated Plasmas for Materials Processing

Author(s)

Scott G. Walton, Naval Research Laboratory
Christopher Muratore, University of DaytonFollow
Darrin Leonhardt, Naval Research Laboratory
Richard F. Fernsler, Naval Research Laboratory
David D. Blackwell, Naval Research Laboratory
Robert A. Meger, Naval Research Laboratory

Document Type

Article

Publication Date

8-2004

Publication Source

Surface and Coatings Technology

Abstract

The results of investigations aimed at characterizing pulsed, electron-beam-produced plasmas for use in materials processing applications are discussed. In situ diagnostics of the bulk plasma and at the plasma/surface interface are reported for plasmas produced in Ar, N₂, and mixtures thereof. Langmuir probes were employed to determine the local electron temperature, plasma density, and plasma potential within the plasma, while ion energy analysis and mass spectrometry were used to interrogate the ion flux at an electrode located adjacent to the plasma. The results illustrate the unique capabilities of electron-beam-produced plasmas and the various parameters available to optimize operating conditions for applications such as nitriding, etching, and thin film deposition.

Inclusive pages

40–46

ISBN/ISSN

0257-8972

Comments

Permission documentation is on file.

Copyright

Copyright © 2004, Elsevier

Publisher

Elsevier

Volume

186

Peer Reviewed

yes

Issue

1-2

eCommons Citation

Walton, Scott G.; Muratore, Christopher; Leonhardt, Darrin; Fernsler, Richard F.; Blackwell, David D.; and Meger, Robert A., "Electron-Beam-Generated Plasmas for Materials Processing" (2004). Chemical and Materials Engineering Faculty Publications. 168.
https://ecommons.udayton.edu/cme_fac_pub/168