Achieving Enhanced Gain in Photorefractive Polymers by Eliminating Electron Contributions Using Large Bias Fields
Document Type
Article
Publication Date
12-2013
Publication Source
Optics Express
Abstract
Photorefractive polymers have been extensively studied for over two decades and have found applications in holographic displays and optical image processing. The complexity of these materials arises from multiple charge contributions, for example, leading to the formation of competing photorefractive gratings. It has been recently shown that in a photorefractive polymer at relatively moderate applied electric fields the primary charge carriers (holes) establish an initial grating, followed by a subsequent competing grating (electrons) resulting in a decreased two-beam coupling and diffraction efficiencies. In this paper, it is shown that with relatively large sustainable bias fields, the two-beam coupling efficiency is enhanced owing to a decreased electron contribution. These results also explain the cause of dielectric breakdown experienced under large bias fields. Our conclusions are supported by self-pumped transient two-beam coupling and photocurrent measurements as a function of applied bias fields at different wavelengths.
Inclusive pages
30392-30400
ISBN/ISSN
1094-4087
Copyright
Copyright © 2013, Optical Society of America
Publisher
Optical Society of America
Volume
21
Peer Reviewed
yes
Issue
25
eCommons Citation
Liebig, C. M.; Buller, S. H.; Banerjee, Partha P.; Basun, S. A.; Blanche, Pierre-Alexandre; Thomas, J.; Christenson, Cory W.; Peyghambarian, N.; and Evans, Dean R., "Achieving Enhanced Gain in Photorefractive Polymers by Eliminating Electron Contributions Using Large Bias Fields" (2013). Electrical and Computer Engineering Faculty Publications. 109.
https://ecommons.udayton.edu/ece_fac_pub/109
COinS
Comments
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