Design and Alignment Strategies of 4f Systems used in the Vectorial Optical Field Generator

Author(s)

Wei Han, University of DaytonFollow
Wen Cheng, University of Dayton
Qiwen Zhan, University of DaytonFollow

Document Type

Article

Publication Date

3-2015

Publication Source

Applied Optics

Abstract

In this paper, the design and alignment strategies of 4� systems used in the vectorial optical field generator are described in detail. Reflection-type 4� systems were adopted due to limited spacing. Alignment patterns are designed and introduced as alignment tools so that the optical property (degree of freedom) controlled by each specific spatial light modulator section can be visualized and alignment of the 4� systems can be performed using the CCD image sharpness as the metric. In particular, blurring due to diffraction effects is minimized when the 4� system is fully aligned.

Inclusive pages

2275-2278

ISBN/ISSN

1559-128X

Comments

Permission documentation is on file.

Copyright

Copyright © 2015, Optical Society of America

Publisher

Optical Society of America

Volume

54

Issue

9

Peer Reviewed

yes

eCommons Citation

Han, Wei; Cheng, Wen; and Zhan, Qiwen, "Design and Alignment Strategies of 4f Systems used in the Vectorial Optical Field Generator" (2015). Electro-Optics and Photonics Faculty Publications. 58.
https://ecommons.udayton.edu/eop_fac_pub/58