Sidewall profiles and etching mechanisms in an inductively coupled plasma for silicon, silicon dioxide and lithium niobate

Author

Lirong Sun, University of Dayton

Date of Award

2009

Degree Name

Ph.D. in Electro-Optics

Department

Department of Electro-Optics and Photonics

Keywords

Plasma etching, Silicon Testing, Silica Testing, Lithium niobate Testing

Rights Statement

Copyright © 2009, author

Recommended Citation

Sun, Lirong, "Sidewall profiles and etching mechanisms in an inductively coupled plasma for silicon, silicon dioxide and lithium niobate" (2009). Graduate Theses and Dissertations. 5866.
https://ecommons.udayton.edu/graduate_theses/5866