Honors Theses

Advisor

Dr. Swapnajit Chakravarty

Department

Electrical and Computer Engineering

Publication Date

4-22-2026

Document Type

Honors Thesis

Abstract

This work investigates the electrical performance and reliability of thin-film amorphous oxide field-effect transistors based on titanium-doped indium oxide (InO:Ti) as the channel material. Devices were fabricated and systematically characterized through current-voltage (I-V) measurements to extract key parameters including threshold voltage, subthreshold swing, and on/off current ratio. Devices were also characterized using a positive and negative bias temperature instability (PBTI/NBTI) to determine the reliability of the devices.

Permission Statement

This item is protected by copyright law (Title 17, U.S. Code) and may only be used for noncommercial, educational, and scholarly purposes.

Keywords

Undergraduate research


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