Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns

Author(s)

Gregory T. Carroll, Columbia University
Jeffrey R. Lancaster, Columbia University
Nicholas J. Turro, Columbia University
Jeffrey T. Koberstein, Columbia University
Angela Mammana, University of DaytonFollow

Document Type

Article

Publication Date

1-2017

Publication Source

Macromolecular Rapid Communications

Abstract

This report demonstrates the electroless deposition of Ni onto micropatterns of poly (acrylic acid) (PAA) photografted to phthalimide‐terminated self‐assembled monolayers (SAMs). PAA is spin‐coated onto phthalimide SAMs and covered with a photomask. UV irradiation selectively binds PAA to exposed regions of the surface, allowing PAA on unexposed regions to be rinsed off. A Pd catalyst is then selectively adsorbed to regions of the surface where PAA is bound. The adsorbed catalyst selectively initiates Ni plating upon immersion of the substrate into a Ni(SO₄) bath.

ISBN/ISSN

1022-1336

Comments

Permission documentation on file.

Copyright

Copyright © 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim

Publisher

Wiley

Volume

38

Peer Reviewed

yes

Issue

2

eCommons Citation

Carroll, Gregory T.; Lancaster, Jeffrey R.; Turro, Nicholas J.; Koberstein, Jeffrey T.; and Mammana, Angela, "Electroless Deposition of Nickel on Photografted Polymeric Microscale Patterns" (2017). Chemistry Faculty Publications. 85.
https://ecommons.udayton.edu/chm_fac_pub/85