Optical Limiting based on Deterministic Beam Fanning in Photorefractive Materials

Author(s)

Partha P. Banerjee, University of DaytonFollow
Jaw-Jueh Liu, University of Alabama, Huntsville
Raj M. Misra, Syracuse University

Document Type

Article

Publication Date

10-1993

Publication Source

Journal of Nonlinear Optical Physics & Materials

Abstract

We propose passive optical limiting based on the photorefractive effect-induced asymmetric deterministic beam fanning in BaTiO₃, and symmetric deterministic beam fanning due to a combination of photovoltaic and thermal effects in LiNbO₃.

Inclusive pages

631-642

ISBN/ISSN

0218-8635

Comments

Permission documentation is on file.

Copyright

Copyright © 1993, World Scientific Publishing

Publisher

World Scientific Publishing

Volume

2

Peer Reviewed

yes

Issue

4

eCommons Citation

Banerjee, Partha P.; Liu, Jaw-Jueh; and Misra, Raj M., "Optical Limiting based on Deterministic Beam Fanning in Photorefractive Materials" (1993). Electrical and Computer Engineering Faculty Publications. 185.
https://ecommons.udayton.edu/ece_fac_pub/185